Ho Wei De

City:

Hsinchu

Country:

Taiwan

Published Applications:

Last publication date:

2013-08-15

Top Assignees for applications by Ho Wei De

The entities that hold a legal rights for patent applications filed by inventor De Ho Wei:

Ho Wei De from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:

Cut-mask patterning process for fin-like field effect transistor (FinFET) device

Patterning process for fin-like field effect transistor (finFET) device

InventorID:

6326644 ⎘