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Inventor profile of:

Max Siebert

City:

Ludwigshafen

Country:

Germany

Published Applications:

Last publication date:

2021-04-08

Top Assignees for applications by Max Siebert

The entities that hold a legal rights for patent applications filed by inventor Siebert Max:

BASF SE 11 Ludwigshafen, Germany
BASF SE 5 Ludwigshafen am Rhein, Germany
BASF SE 1 , Germany

Recent patent applications by Siebert Max

Max Siebert from Ludwigshafen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-04-08

US20210102093A1

Chemistry; metallurgy

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES

#2 | 2020-09-24

US20200299547A1

Chemistry; metallurgy

Chemical mechanical polishing composition

#3 | 2020-09-17

US20200294813A1

Electricity

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#4 | 2019-05-16

US20190144781A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#5 | 2019-01-03

US20190002802A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#6 | 2018-12-27

US20180371371A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#7 | 2018-08-16

US20180230333A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates

#8 | 2018-01-18

US20180016468A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#9 | 2017-12-28

US20170369743A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium

#10 | 2017-12-28

US20170369741A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#11 | 2017-12-21

US20170362464A1

Chemistry; metallurgy

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#12 | 2017-06-15

US20170166778A1

Chemistry; metallurgy

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLY(AMINOACID)

#13 | 2017-06-08

US20170158913A1

Chemistry; metallurgy

Chemical mechanical polishing (CMP) composition

#14 | 2017-01-26

US20170022107A1

Chemistry; metallurgy

SYNTHESIS AND APPLICATION OF CaSO4-BASED HARDENING ACCELERATORS

#15 | 2015-12-03

US20150342887A1

Human necessities

Production Of Inorganic-Organic Composite Materials By Reactive Spray-Drying

#16 | 2014-08-14

US20140228334A1

Human necessities

Production of inorganic-organic composite materials by reactive spray-drying

#17 | 2014-01-30

US20140031463A1

Chemistry; metallurgy

COMPOSITION OF MICROCAPSULES WITH A SILICA SHELL AND A METHOD FOR THEIR PREPARATION

InventorID:

632813 ⎘