Hsinchu
Taiwan
28
2023-10-05
The entities that hold a legal rights for patent applications filed by inventor Chen Ming-Jui:
Ming-Jui Chen from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#2 | 2023-10-05Method for fabricating a fin with minimal length between two single-diffusion break (SDB) trenches
#3 | 2022-05-19Semiconductor device with a single diffusion break structure having a sidewall aligned with a gate sidewall
#4 | 2017-01-26Method for optimizing an integrated circuit layout design
#5 | 2017-01-19Static random access memory layout structure
#6 | 2016-12-01Semiconductor structure and method of forming the same
#7 | 2016-10-20Method for decomposing a layout of an integrated circuit
#8 | 2016-06-14Method for forming a semiconductor structure
#9 | 2016-05-26Pattern verifying method
#10 | 2015-12-03Method for generating layout pattern
#11 | 2015-11-19Method and apparatus for integrated circuit design
#12 | 2015-05-07Method of optical proximity correction
#13 | 2015-03-12Method for forming photo-mask and OPC method
#14 | 2015-02-19Method for generating layout pattern
#15 | 2015-01-06Method for optical proximity correction
#16 | 2014-09-11Mask set for double exposure process and method of using the mask set
#17 | 2014-09-11Method for patterning semiconductor structure
#18 | 2014-07-15Method for inspecting photo-mask
#19 | 2014-07-15Method of optical proximity correction
#20 | 2014-06-03Method for making photomask layout
#21 | 2014-06-03Method for separating photomask pattern
#22 | 2014-04-15Method of optical proximity correction in combination with double patterning technique
#23 | 2014-02-06Method of optical proximity correction according to complexity of mask pattern
#24 | 2014-01-07Method for making photomask layout
#25 | 2013-10-24Mask set for double exposure process and method of using the mask set
#26 | 2013-06-27Mask pattern and correcting method thereof
#27 | 2013-06-25Method for designing stressor pattern
#28 | 2006-10-03Chrome-less mask inspection method
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