Taichung
Taiwan
24
2024-10-24
The entities that hold a legal rights for patent applications filed by inventor Yang Chi:
Chi Yang from Taichung, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
#2 | 2021-11-25Extreme ultraviolet lithography system
#3 | 2021-02-04Extreme ultraviolet lithography system
#4 | 2021-01-21Lithography system and method thereof
#5 | 2020-11-05Radiation source apparatus and method for decreasing debris in radiation source apparatus
#6 | 2020-10-22Method and apparatus for removing debris from collector
#7 | 2020-10-01Radiation source apparatus
#8 | 2020-10-01Extreme ultraviolet radiation source and cleaning method thereof
#9 | 2020-05-07Pressurized tin collection bucket with in-line draining mechanism
#10 | 2020-04-02Vessel for extreme ultraviolet radiation source
#11 | 2020-04-02Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
#12 | 2020-04-02Particle image velocimetry of extreme ultraviolet lithography systems
#13 | 2020-03-05Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
#14 | 2020-02-20Apparatus and method for generating extreme ultraviolet radiation
#15 | 2020-02-20Lithography apparatus and cleaning method thereof
#16 | 2020-02-20Extreme ultraviolet radiation source
#17 | 2020-02-06Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation
#18 | 2020-01-30Extreme ultraviolet radiation source and cleaning method thereof
#19 | 2020-01-07Pressurized tin collection bucket with in-line draining mechanism
#20 | 2020-01-02EUV light source and apparatus for lithography
#21 | 2019-12-17Extreme ultraviolet radiation source and droplet catcher thereof
#22 | 2019-05-16Apparatus and method for generating extreme ultraviolet radiation
#23 | 2019-03-28Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
#24 | 2019-03-28Light source, EUV lithography system, and method for generating EUV radiation
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