Masami Mesuda

City:

Ayase

Country:

Japan

Published Applications:

Last publication date:

2024-12-12

Top Assignees for applications by Masami Mesuda

The entities that hold a legal rights for patent applications filed by inventor Mesuda Masami:

Masami Mesuda from Ayase, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

SPUTTERING TARGET, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SPUTTERING FILM USING SPUTTERING TARGET

Multilayer film structure and method for producing same

METHOD FOR PRODUCING CHROMIUM SINTERED BODY, METHOD FOR PRODUCING SPUTTERING TARGET, AND METHOD FOR PRODUCING SUBSTRATE WITH CHROMIUM FILM

Yttrium ingot and sputtering target in which the yttrium ingot is used

Cr—Si sintered body, sputtering target, and method for producing thin film

Gallium nitride-based sintered compact and method for manufacturing same

GALLIUM NITRIDE-BASED SINTERED BODY AND METHOD FOR MANUFACTURING SAME

GALLIUM NITRIDE PARTICLES AND METHOD FOR PRODUCING SAME

InventorID:

6574693 ⎘