Jyoetsu
Japan
12
2017-07-27
The entities that hold a legal rights for patent applications filed by inventor DOMON Daisuke:
Daisuke DOMON from Jyoetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Polymer compound, negative resist composition, laminate, patterning process, and compound
#2 | 2017-02-09Polymer compound, positive resist composition, laminate, and resist patterning process
#3 | 2015-09-24Chemically-amplified negative resist composition and resist patterning process using the same
#4 | 2015-09-10Chemically-amplified positive resist composition and resist patterning process using the same
#5 | 2015-07-16Onium salt, chemically amplified positive resist composition, and patterning process
#6 | 2014-02-20Negative resist composition and patterning process
#7 | 2012-12-06Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
#8 | 2011-06-16Negative resist composition and patterning process
#9 | 2011-06-02Negative resist composition and patterning process
#10 | 2011-01-06Positive resist composition and pattern forming process
#11 | 2010-12-02Negative resist composition and patterning process using the same
#12 | 2010-11-18Negative resist composition, patterning process, and testing process and preparation process of negative resist composition
658268 ⎘