🔗 Permalink

Inventor profile of:

Satoshi WATANABE

City:

Jyoetsu

Country:

Japan

Published Applications:

23

Last publication date:

2017-02-09

Top Assignees for applications by Satoshi WATANABE

The entities that hold a legal rights for patent applications filed by inventor WATANABE Satoshi:

SHIN-ETSU CHEMICAL CO., LTD 23 Tokyo, Japan
SHIN-ETSU POLYMER CO., LTD. 1 Tokyo, Japan

Recent patent applications by WATANABE Satoshi

Satoshi WATANABE from Jyoetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-02-09

US20170037167A1

Chemistry; metallurgy

Polymer compound, positive resist composition, laminate, and resist patterning process

#2 | 2017-01-26

US20170023855A1

Photomask blank and method for manufacturing photomask blank

#3 | 2015-09-24

US20150268556A1

Chemically-amplified negative resist composition and resist patterning process using the same

#4 | 2015-09-10

US20150253664A1

Chemically-amplified positive resist composition and resist patterning process using the same

#5 | 2015-07-16

US20150198876A1

Onium salt, chemically amplified positive resist composition, and patterning process

#6 | 2015-05-21

US20150140492A1

Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition

#7 | 2015-03-26

US20150086909A1

Method for manufacturing photomask blank

#8 | 2015-03-26

US20150086908A1

Photomask blank and method for manufacturing photomask blank

#9 | 2014-02-20

US20140051025A1

Negative resist composition and patterning process

#10 | 2012-12-06

US20120308920A1

Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process

#11 | 2012-07-19

US20120183893A1

Resist composition and patterning process

#12 | 2012-07-19

US20120183892A1

Resist composition and patterning process

#13 | 2012-01-26

US20120021341A1

Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process

#14 | 2011-08-04

US20110189607A1

Chemistry; metallurgy

Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process

#15 | 2011-06-16

US20110143266A1

Negative resist composition and patterning process

#16 | 2011-06-02

US20110129765A1

Negative resist composition and patterning process

#17 | 2011-01-06

US20110003251A1

Positive resist composition and pattern forming process

#18 | 2010-12-02

US20100304301A1

Negative resist composition and patterning process using the same

#19 | 2010-11-18

US20100291484A1

Negative resist composition, patterning process, and testing process and preparation process of negative resist composition

#20 | 2010-07-01

US20100167207A1

Chemically amplified positive resist composition and resist patterning process

#21 | 2010-01-14

US20100009299A1

Resist composition and patterning process

#22 | 2010-01-14

US20100009286A1

Chemically-amplified positive resist composition and patterning process thereof

#23 | 2010-01-14

US20100009271A1

Resist patterning process and manufacturing photo mask

InventorID:

658269 ⎘