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Inventor profile of:

Ryunosuke HANDA

City:

Joetsu-shi

Country:

Japan

Published Applications:

8

Last publication date:

2026-01-15

Top Assignees for applications by Ryunosuke HANDA

The entities that hold a legal rights for patent applications filed by inventor HANDA Ryunosuke:

  • SHIN-ETSU CHEMICAL CO., LTD 8 Tokyo, Japan

Recent patent applications by HANDA Ryunosuke

Ryunosuke HANDA from Joetsu-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-15
US20260016751A1
Physics

LAMINATE, PREPARATION OF LAMINATE AND PATTERN FORMING PROCESS

#2 | 2025-09-18
US20250291249A1
Physics

RESIST COMPOSITION, LAMINATE, AND PATTERN FORMING PROCESS

#3 | 2025-09-18
US20250291245A1
Physics

RESIST COMPOSITION AND PATTERN FORMING PROCESS

#4 | 2025-07-31
US20250244666A1
Physics

RESIST COMPOSITION AND PATTERNING PROCESS

#5 | 2024-11-14
US20240377730A1
Physics

RESIST COMPOSITION AND PATTERN FORMING PROCESS

#6 | 2024-10-17
US20240345480A1
Physics

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

#7 | 2024-08-15
US20240272550A1
Physics

RESIST COMPOSITION AND PATTERN FORMING PROCESS

#8 | 2024-04-11
US20240116958A1
Chemistry; metallurgy

Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist Material

InventorID:

6623286 ⎘

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