Stuttgart
Germany
4
2026-07-02
Matthias Fetzer from Stuttgart, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR REDUCING THE EFFECTS OF PARASITIC FORCES AND/OR MOMENTS ON THE IMAGING QUALITY OF A PROJECTION-EXPOSURE APPARATUS, AND PROJECTION-EXPOSURE APPARATUS WITH A MODULE
#2 | 2025-07-10COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITHOGRAPHY SYSTEM
#3 | 2025-07-03OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM COMPRISING SAME AND PROJECTION EXPOSURE SYSTEM COMPRISING THE OPTICAL ELEMENT AND/OR THE OPTICAL SYSTEM
#4 | 2024-05-30OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS
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