Berlin
Germany
5
2013-03-21
The entities that hold a legal rights for patent applications filed by inventor Ostermay Ina:
Ina Ostermay from Berlin, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
CMOS SEMICONDUCTOR DEVICES HAVING STRESSOR REGIONS AND RELATED FABRICATION METHODS
#2 | 2013-02-07N-CHANNEL TRANSISTOR COMPRISING A HIGH-K METAL GATE ELECTRODE STRUCTURE AND A REDUCED SERIES RESISTANCE BY EPITAXIALLY FORMED SEMICONDUCTOR MATERIAL IN THE DRAIN AND SOURCE AREAS
#3 | 2013-01-31Methods of forming a PMOS device with in situ doped epitaxial source/drain regions
#4 | 2012-06-28Reduction of Defect Rates in PFET Transistors Comprising a Silicon/Germanium Semiconductor Material by Providing a Graded Germanium Concentration
#5 | 2012-06-21Embedded sigma-shaped semiconductor alloys formed in transistors by applying a uniform oxide layer prior to cavity etching
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