Reno, Nevada
United States
21
2025-05-08
The entities that hold a legal rights for patent applications filed by inventor MUDD Daniel T.:
Daniel T. MUDD from Reno, US has applied for patents for these inventions. The list has both pending applications and granted patents:
FLOW CONTROL SYSTEM, METHOD, AND APPARATUS
#2 | 2024-01-25FLOW CONTROL SYSTEM, METHOD, AND APPARATUS
#3 | 2022-01-06Flow control system, method, and apparatus
#4 | 2021-01-07Flow control system, method, and apparatus
#5 | 2020-12-24Flow control system, method, and apparatus
#6 | 2020-08-13Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
#7 | 2019-08-08Flow control system, method, and apparatus
#8 | 2018-08-02Flow control system, method, and apparatus
#9 | 2018-05-22Wider dynamic accuracy range for gas delivery devices
#10 | 2018-03-29Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
#11 | 2018-01-04Flow control system, method, and apparatus
#12 | 2017-07-06Flow control showerhead with integrated flow restrictors for improved gas delivery to a semiconductor process
#13 | 2016-07-28Flow control system, method, and apparatus
#14 | 2016-02-11REVERSE FLOW MODE FOR REGULATING PRESSURE OF AN ACCUMULATED VOLUME WITH FAST UPSTREAM BLEED DOWN
#15 | 2016-01-21PRESSURE-BASED MASS FLOW CONTROLLER WITH REVERSE FLOW MODE FOR FAST BLEED DOWN
#16 | 2016-01-14Controlled delivery of process gas using a remote pressure measurement device
#17 | 2015-11-17Flow node to deliver process gas using a remote pressure measurement device
#18 | 2014-08-21Gas delivery system for outputting fast square waves of process gas during semiconductor processing
#19 | 2014-07-08Low flow injector to deliver a low flow of gas to a remote location
#20 | 2014-03-13Pressure based mass flow controller
#21 | 2007-04-26Higher accuracy pressure based flow controller
681979 ⎘