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Inventor profile of:

Benjamin Kam

City:

Heverlee

Country:

Belgium

Published Applications:

1

Last publication date:

2025-02-13

Recent patent applications by Kam Benjamin

Benjamin Kam from Heverlee, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-02-13

US20250053092A1

AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST

InventorID:

6929234 ⎘