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Inventor profile of:

Ayaka YOSHIDA

City:

Tokyo

Country:

Japan

Published Applications:

2

Last publication date:

2025-06-26

Recent patent applications by YOSHIDA Ayaka

Ayaka YOSHIDA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-06-26

US20250210375A1

SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER

#2 | 2025-02-27

US20250066621A1

Chemistry; metallurgy

COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE

InventorID:

6940637 ⎘