🔗 Permalink

Inventor profile of:

Ryuta OHNUMA

City:

Tokyo

Country:

Japan

Published Applications:

1

Last publication date:

2025-06-05

Recent patent applications by OHNUMA Ryuta

Ryuta OHNUMA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-06-05

US20250181691A1

Authentication System and Authentication Method

InventorID:

7039464 ⎘