Alexander J. Pasadyn

Process control using analysis of an upstream process

Parallel fault detection

Dynamic adaptive sampling rate for model prediction

Controlling processing of semiconductor wafers based upon end of line parameters

Initiating test runs based on fault detection results

Applying a self-adaptive filter to a drifting process

Determining transmission of error effects for improving parametric performance

Method and apparatus for initializing tool controllers based on tool event data

Method and apparatus for implementing competing control models

Matching data related to multiple metrology tools

Method and apparatus for updating control state variables of a process control model based on rework data

Method and apparatus for dispatching based on metrology tool performance

Method and apparatus for dynamically monitoring controller tuning parameters

Dispatch and/or disposition of material based upon an expected parameter result

Method and apparatus for controlling process target values based on manufacturing metrics

Process control based on an estimated process result

Method and apparatus for predicting electrical parameters using measured and predicted fabrication parameters

Determining a next tool state based on fault detection information

Method and apparatus for modifying design constraints based on observed performance

Method and apparatus for distinguishing between sources of process variation

Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information