Tokyo
Japan
2
2025-08-21
Sangchul LEE from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
RAW MATERIAL FOR OBTAINING ABRASIVE GRAINS AND METHOD FOR SELECTING SAME, ABRASIVE GRAIN PRODUCTION METHOD, POLISHING SOLUTION PRODUCTION METHOD, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION
#2 | 2025-08-14RAW MATERIAL FOR OBTAINING ABRASIVE GRAINS AND SELECTION METHOD THEREFOR, PRODUCTION METHOD FOR ABRASIVE GRAINS, PRODUCTION METHOD FOR POLISHING LIQUID, POLISHING METHOD, PRODUCTION METHOD FOR COMPONENT, AND PRODUCTION METHOD FOR SEMICONDUCTOR COMPONENT
7352888 ⎘