Stefan Wurm

City:

Dublin, California

Country:

United States

Published Applications:

Last publication date:

2006-07-18

Top Assignees for applications by Stefan Wurm

The entities that hold a legal rights for patent applications filed by inventor Wurm Stefan:

Infineon Technologies AG 3 Munich, Germany

Recent patent applications by Wurm Stefan

Stefan Wurm from Dublin, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2006-07-18

US10442739

Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coating

#2 | 2006-04-18

US10673964

Photosensitive coating material for a substrate and process for exposing the coated substrate

#3 | 2005-02-01

US10292866

Reflection mask for EUV-lithography and method for fabricating the reflection mask

InventorID:

7410418 ⎘