Round Rock, Texas
United States
12
2026-05-21
The entities that hold a legal rights for patent applications filed by inventor Thompson Ecron D.:
Ecron D. Thompson from Round Rock, US has applied for patents for these inventions. The list has both pending applications and granted patents:
METHODS, DEVICES, AND SYSTEMS FOR ADJUSTING DROP PATTERNS BASED ON OVERBURDEN CHANGES
#2 | 2024-07-04GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION REGIONS
#3 | 2021-05-06Residual layer thickness compensation in nano-fabrication by modified drop pattern
#4 | 2019-08-01Strain and kinetics control during separation phase of imprint process
#5 | 2017-12-07Imprint lithography template, system, and method of imprinting
#6 | 2014-05-01Strain and Kinetics Control During Separation Phase of Imprint Process
#7 | 2010-10-14METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES
#8 | 2010-04-29Strain and kinetics control during separation phase of imprint process
#9 | 2010-04-15Complementary Alignment Marks for Imprint Lithography
#10 | 2010-04-01Particle Mitigation for Imprint Lithography
#11 | 2009-10-08Template having alignment marks formed of contrast material
#12 | 2007-12-13Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
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