Cedar Park, Texas
United States
22
2026-04-02
The entities that hold a legal rights for patent applications filed by inventor Lu Xiaoming:
Xiaoming Lu from Cedar Park, US has applied for patents for these inventions. The list has both pending applications and granted patents:
FLEXIBLE CHUCK WITH STRAIN GAUGE
#2 | 2025-07-03METHOD OF SHAPING A SURFACE, SHAPING SYSTEM, AND METHOD OF MANUFACTURING AN ARTICLE
#3 | 2024-09-26PLANARIZATION PROCESS, PLANARIZATION SYSTEM, AND METHOD OF MANUFACTURING AN ARTICLE
#4 | 2024-05-30SYSTEMS, DEVICES, AND METHODS FOR REGISTERING A SUPERSTRATE OF AN IMPRINT TOOL
#5 | 2023-03-30Method of shaping a surface, shaping system, and method of manufacturing an article
#6 | 2023-01-19Method of determining the initial contact point for partial fields and method of shaping a surface
#7 | 2022-12-01Planarization process, planarization system, and method of manufacturing an article
#8 | 2022-06-16Planarization apparatus, planarization process, and method of manufacturing an article
#9 | 2022-04-28System and method for shaping a film with a scaled calibration measurement parameter
#10 | 2022-03-31Planarization apparatus including superstrate chuck with bendable periphery
#11 | 2019-10-15Active metrology frame and thermal frame temperature control in imprint lithography
#12 | 2019-08-01Strain and kinetics control during separation phase of imprint process
#13 | 2019-06-20Alignment control in nanoimprint lithography based on real-time system identification
#14 | 2017-10-05System and methods for nanoimprint lithography
#15 | 2017-02-16Imprint apparatus, and method of manufacturing article
#16 | 2017-02-02Imprint apparatus and article manufacturing method
#17 | 2016-10-06Imprint apparatus and method of manufacturing article
#18 | 2015-05-21High throughput imprint based on contact line motion tracking control
#19 | 2014-05-01Strain and Kinetics Control During Separation Phase of Imprint Process
#20 | 2010-04-29Strain and kinetics control during separation phase of imprint process
#21 | 2010-04-22Gas Environment for Imprint Lithography
#22 | 2009-06-04High throughput imprint based on contact line motion tracking control
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