Shingo Okubo

City:

Tsukuba

Country:

Japan

Published Applications:

Last publication date:

2024-02-15

Top Assignees for applications by Shingo Okubo

The entities that hold a legal rights for patent applications filed by inventor Okubo Shingo:

L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude 6 Paris, France
HITACHI KOKUSAI ELECTRIC INC. 2 Tokyo, Japan
L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des Procedes Georges claude 1 Paris, France
L'Air Liquide SociétéAnonyme pour I'Etude et I'Exploitation des Procédés Georges Claude 1 Paris, France

Recent patent applications by Okubo Shingo

Shingo Okubo from Tsukuba, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-02-15

US20240052484A1

Chemistry; metallurgy

SUPPLY SYSTEM FOR LOW VOLATILITY PRECURSORS

#2 | 2019-01-24

US20190027357A1

Electricity

VAPOR DISPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES

#3 | 2017-06-29

US20170186597A1

Electricity

VAPOR DEPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES

#4 | 2016-04-21

US20160111272A1

Electricity

Vapor deposition of silicon-containing films using penta-substituted disilanes

#5 | 2014-09-25

US20140287598A1

Electricity

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#6 | 2014-09-25

US20140287596A1

Electricity

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#7 | 2014-05-01

US20140119977A1

Chemistry; metallurgy

Metal heterocyclic compounds for deposition of thin films

#8 | 2009-12-31

US20090321733A1

Chemistry; metallurgy

Metal heterocyclic compounds for deposition of thin films

#9 | 2009-12-03

US20090299084A1

Chemistry; metallurgy

Tellurium precursors for film deposition

InventorID:

744722 ⎘