Kousuke Doi

City:

Kanagawa

Country:

Japan

Published Applications:

Last publication date:

2005-11-15

Top Assignees for applications by Kousuke Doi

The entities that hold a legal rights for patent applications filed by inventor Doi Kousuke:

Kousuke Doi from Kanagawa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Positive photoresist composition

Phenol novolak resin, production process thereof, and positive photoresist composition using the same

Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio

Positive photoresist composition

InventorID:

7466024 ⎘