Johnathan Faltermeier

City:

Lagrange, New York

Country:

United States

Published Applications:

Last publication date:

2005-11-01

Top Assignees for applications by Johnathan Faltermeier

The entities that hold a legal rights for patent applications filed by inventor Faltermeier Johnathan:

INTERNATIONAL BUSINESS MACHINES CORPORATION 2 ARMONK, NY United States
Infineon Technolgies AG 1 Munich, Germany

Recent patent applications by Faltermeier Johnathan

Johnathan Faltermeier from Lagrange, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2005-11-01

US10803395

Pitcher-shaped active area for field effect transistor and method of forming same

#2 | 2005-11-01

US10406645

Method of reducing erosion of a nitride gate cap layer during reactive ion etch of nitride liner layer for bit line contact of DRAM device

InventorID:

7468570 ⎘