Daegu
South Korea
31
2026-01-01
The entities that hold a legal rights for patent applications filed by inventor LEE Su Jin:
Su Jin LEE from Daegu, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
SPIN ON CARBON HARDMASK COMPOSITIONS WITH LOW EVAPORATION LOSS AND PATTERNING METHOD BY USING THE SAME
#2 | 2025-12-18CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION
#3 | 2025-07-24RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME
#4 | 2025-06-19CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION
#5 | 2025-06-19CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT
#6 | 2025-01-09SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFORMANCE AND PATTERNING METHOD USING SAME
#7 | 2023-11-02I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN
#8 | 2023-08-24PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
#9 | 2022-10-27PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
#10 | 2022-08-11PROCESS LIQUID COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
#11 | 2022-06-09Highly thick spin-on-carbon hard mask composition and patterning method using same
#12 | 2022-06-02Etching pattern forming method in semiconductor manufacturing process
#13 | 2022-03-31Method for forming silicon or silicon compound pattern in semiconductor manufacturing process
#14 | 2022-01-13Process liquid for extreme ultraviolet lithography and pattern forming method using same
#15 | 2021-10-28Organic-inorganic hybrid photoresist processing liquid composition
#16 | 2021-07-15Chemically amplified positive photoresist composition for improving pattern profile
#17 | 2021-07-15Process solution composition for extreme ultraviolet lithography, and method for forming pattern by using same
#18 | 2021-03-25Process liquid composition for extreme ultraviolet lithography and pattern forming method using same
#19 | 2021-03-18Etching method for forming micro silicon pattern in semiconductor manufacturing process
#20 | 2021-03-04EUV developer composition for forming photosensitive photoresist micropattern
#21 | 2020-11-19Developer composition, for EUV light source, for forming photosensitive photoresist micropattern
#22 | 2020-06-11Method and composition for improving LWR in patterning step using negative tone photoresist
#23 | 2020-04-09Photoresist pattern shrinking composition and pattern shrinking method
#24 | 2019-08-22High etch resistance spin-on carbon hard mask composition and patterning method using same
#25 | 2019-05-09Method and composition for improving LWR in patterning step using negative tone photoresist
#26 | 2019-05-09Chemically-amplified-type negative-type photoresist composition
#27 | 2019-04-04Negative photoresist composition for KRF laser, having high resolution and high aspect ratio
#28 | 2018-08-16Slurry composition for CMP and polishing method using same
#29 | 2018-07-19Negative photoresist composition for KrF laser for forming semiconductor patterns
#30 | 2015-10-01Coating composition for preventing collapse of capacitor
#31 | 2014-05-15Apparatus, method, and system for controlling boomerang
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