Inventor profile of:

Seung Hyun Lee

City:

Daegu

Country:

South Korea

Published Applications:

45

Last publication date:

2026-01-01

Top Assignees for applications by Seung Hyun Lee

The entities that hold a legal rights for patent applications filed by inventor Lee Seung Hyun:

Recent patent applications by Lee Seung Hyun

Seung Hyun Lee from Daegu, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-01
US20260005022A1
Electricity

SPIN ON CARBON HARDMASK COMPOSITIONS WITH LOW EVAPORATION LOSS AND PATTERNING METHOD BY USING THE SAME

#2 | 2025-12-18
US20250383599A1
Physics

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION

#3 | 2025-07-24
US20250236813A1
Chemistry; metallurgy

RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME

#4 | 2025-06-19
US20250199406A1
Physics

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION

#5 | 2025-06-19
US20250199405A1
Physics

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT

#6 | 2025-04-24
US20250129266A1
Chemistry; metallurgy

SLURRY COMPOSITION FOR FINAL POLISHING OF SILICON WAFER FOR REDUCING NUMBER OF SURFACE DEFECTS AND HAZE AND FINAL POLISHING METHOD USING SAME

#7 | 2025-01-09
US20250013154A1
Physics

SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFORMANCE AND PATTERNING METHOD USING SAME

#8 | 2024-12-19
US20240417620A1
Chemistry; metallurgy

MOLYBDENUM FILM ETCHANT COMPOSITION AND ETCHING METHOD USING SAME

#9 | 2023-11-02
US20230350293A1
Physics

I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN

#10 | 2023-09-21
US20230295500A1
Chemistry; metallurgy

ETCHANT COMPOSITION FOR ADJUSTING ETCHING SELECTIVITY OF TITANIUM NITRIDE FILM WITH RESPECT TO TUNGSTEN FILM, AND ETCHING METHOD USING SAME

#11 | 2023-08-24
US20230266672A1
Physics

PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME

#12 | 2022-10-27
US20220342313A1
Physics

PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME

#13 | 2022-08-11
US20220251472A1
Chemistry; metallurgy

PROCESS LIQUID COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME

#14 | 2022-06-23
US20220199217A1
Physics

METHOD OF DETERMINING CONTINUOUS DRUG DOSE USING REINFORCEMENT LEARNING AND PHARMACOKINETIC-PHARMACODYNAMIC MODELS

#15 | 2022-06-09
US20220179318A1
Physics

Highly thick spin-on-carbon hard mask composition and patterning method using same

#16 | 2022-06-02
US20220172955A1
Electricity

Etching pattern forming method in semiconductor manufacturing process

#17 | 2022-05-12
US20220146395A1
Physics

Method for analyzing silicon concentration in phosphoric acid solution

#18 | 2022-05-12
US20220145131A1
Chemistry; metallurgy

Slurry composition for polishing silicon oxide film, and polishing method using same

#19 | 2022-05-05
US20220135903A1
Chemistry; metallurgy

Cleaning liquid composition for semiconductor wafer and cleaning method using same

#20 | 2022-04-28
US20220127530A1
Chemistry; metallurgy

Etching composition for silicon nitride film

#21 | 2022-03-31
US20220102158A1
Electricity

Method for forming silicon or silicon compound pattern in semiconductor manufacturing process

#22 | 2022-01-13
US20220011673A1
Physics

Process liquid for extreme ultraviolet lithography and pattern forming method using same

#23 | 2021-10-28
US20210333709A1
Physics

Organic-inorganic hybrid photoresist processing liquid composition

#24 | 2021-07-15
US20210216013A1
Physics

Chemically amplified positive photoresist composition for improving pattern profile

#25 | 2021-07-15
US20210214649A1
Chemistry; metallurgy

Process solution composition for extreme ultraviolet lithography, and method for forming pattern by using same

#26 | 2021-03-25
US20210088910A1
Physics

Process liquid composition for extreme ultraviolet lithography and pattern forming method using same

#27 | 2021-03-04
US20210063887A1
Physics

EUV developer composition for forming photosensitive photoresist micropattern

#28 | 2020-06-18
US20200190423A1
Chemistry; metallurgy

Cutting oil composition

#29 | 2020-06-11
US20200183284A1
Physics

Method and composition for improving LWR in patterning step using negative tone photoresist

#30 | 2020-06-04
US20200170578A1
Human necessities

Apparatus, method, and program for predicting hypoglycemia, and apparatus, method, and program for generating hypoglycemia prediction model

#31 | 2020-04-09
US20200110339A1
Physics

Photoresist pattern shrinking composition and pattern shrinking method

#32 | 2019-12-19
US20190382698A1
Chemistry; metallurgy

Composition for performing cleaning after chemical/ mechanical polishing

#33 | 2019-08-22
US20190258163A1
Physics

High etch resistance spin-on carbon hard mask composition and patterning method using same

#34 | 2019-05-09
US20190137880A1
Physics

Method and composition for improving LWR in patterning step using negative tone photoresist

#35 | 2019-05-09
US20190137871A1
Physics

Chemically-amplified-type negative-type photoresist composition

#36 | 2019-04-04
US20190101827A1
Physics

Negative photoresist composition for KRF laser, having high resolution and high aspect ratio

#37 | 2018-11-08
US20180319994A1
Chemistry; metallurgy

Anti-reflection coating composition and anti-reflection film utilizing same

#38 | 2018-08-30
US20180246404A1
Physics

I-line negative type photoresist composition having excellent etching resistance

#39 | 2018-08-16
US20180230334A1
Chemistry; metallurgy

Slurry composition for CMP and polishing method using same

#40 | 2018-07-19
US20180203351A1
Physics

Negative photoresist composition for KrF laser for forming semiconductor patterns

#41 | 2018-06-14
US20180166818A1
Electricity

High-voltage connector and high-voltage power supply connecting device having the same

#42 | 2017-01-19
US20170017161A1
Physics

Cleaning composition for photolithography and method of forming photoresist pattern using the same

#43 | 2014-08-07
US20140219542A1
Physics

Method of generating height information in circuit board inspection apparatus

#44 | 2014-07-17
US20140200632A1
Human necessities

SELF-DIRECTED REHABILITATION TRAINING METHOD COMBINING BRAIN SIGNALS AND FUNCTIONAL ELECTROSTIMULATION

#45 | 2014-05-15
US20140135873A1
Physics

Rehabilitation training system and method

InventorID:

764237 ⎘