Riku Muneyasu

City:

Echizen-shi

Country:

Japan

Published Applications:

Last publication date:

2026-04-09

Top Assignees for applications by Riku Muneyasu

The entities that hold a legal rights for patent applications filed by inventor Muneyasu Riku:

Riku Muneyasu from Echizen-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING THE SAME

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING THE SAME

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR INSPECTING REFLECTIVE MASK BLANK-RELATED SUBSTRATE

InventorID:

7662862 ⎘