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Inventor profile of:

Chenyu WANG

City:

Shanghai

Country:

China

Published Applications:

1

Last publication date:

2025-12-25

Recent patent applications by WANG Chenyu

Chenyu WANG from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-12-25

US20250391644A1

Insulated Dual Liner for Plasma Processing Chamber

InventorID:

7664056 ⎘