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Inventor profile of:

Bin WEI

City:

Hangzhou

Country:

China

Published Applications:

1

Last publication date:

2026-05-14

Recent patent applications by WEI Bin

Bin WEI from Hangzhou, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-14

US20260136945A1

OVERLAY MARK, METHOD OF FORMING SAME AND MEASUREMENT METHOD

InventorID:

7787005 ⎘