Hyo-Young KWON

City:

Uiwang-si

Country:

South Korea

Published Applications:

Last publication date:

2015-11-05

Top Assignees for applications by Hyo-Young KWON

The entities that hold a legal rights for patent applications filed by inventor KWON Hyo-Young:

Hyo-Young KWON from Uiwang-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

Photocurable composition and device including barrier layer formed from composition

Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the Same

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device

Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition

Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition

Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patterns

Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same

InventorID:

815019 ⎘