Yusuke BIYAJIMA

City:

Jyoetsu

Country:

Japan

Published Applications:

Last publication date:

2018-01-11

Top Assignees for applications by Yusuke BIYAJIMA

The entities that hold a legal rights for patent applications filed by inventor BIYAJIMA Yusuke:

SHIN-ETSU CHEMICAL CO., LTD 11 Tokyo, Japan

Recent patent applications by BIYAJIMA Yusuke

Yusuke BIYAJIMA from Jyoetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-01-11

US20180011405A1

Physics

Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition

#2 | 2016-03-03

US20160064220A1

Electricity

Method for producing semiconductor apparatus substrate

#3 | 2015-04-09

US20150099216A1

Physics

Method for manufacturing a resist composition

#4 | 2015-04-02

US20150093901A1

Electricity

Composition for forming a silicon-containing resist under layer film and patterning process

#5 | 2015-03-05

US20150064625A1

Physics

Method for producing resist composition

#6 | 2014-11-13

US20140335453A1

Physics

Method for producing resist composition

#7 | 2014-07-24

US20140205951A1

Physics

THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SAME, AND PATTERNING PROCESS USING SAME

#8 | 2012-07-19