Dresden
Germany
5
2013-02-14
The entities that hold a legal rights for patent applications filed by inventor Otterbach Ralf:
Ralf Otterbach from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD OF FORMING A SEMICONDUCTOR DEVICE
#2 | 2011-09-22Dopant profile tuning for MOS devices by adapting a spacer width prior to implantation
#3 | 2010-12-30Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning
#4 | 2010-11-18Multi-step deposition of a spacer material for reducing void formation in a dielectric material of a contact level of a semiconductor device
#5 | 2009-04-30Dopant profile tuning for MOS devices by adapting a spacer width prior to implantation
85186 ⎘