Gottenheim
Germany
12
2016-10-27
The entities that hold a legal rights for patent applications filed by inventor Werber Armin:
Armin Werber from Gottenheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Facet mirror for use in a projection exposure apparatus for microlithography
#2 | 2015-01-15Projection exposure apparatus for microlithography for the production of semiconductor components
#3 | 2014-11-13Microlithographic projection exposure apparatus
#4 | 2014-10-16Illumination system of a microlithographic projection exposure apparatus having a temperature control device
#5 | 2014-08-07Light modulator and illumination system of a microlithographic projection exposure apparatus
#6 | 2012-01-12Actuator including magnet for a projection exposure system and projection exposure system including a magnet
#7 | 2011-11-10Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography
#8 | 2011-09-29Projection exposure apparatus for microlithography for the production of semiconductor components
#9 | 2011-07-28Microlithographic projection exposure apparatus
#10 | 2011-07-28Illumination system of a microlithographic projection exposure apparatus having a temperature control device
#11 | 2011-01-06Facet mirror for use in a projection exposure apparatus for microlithography
#12 | 2010-10-14Mirror for guiding a radiation bundle
860920 ⎘