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Inventor profile of:

Ryosuke WATANABE

City:

Isehara

Country:

Japan

Published Applications:

Last publication date:

2019-05-16

Top Assignees for applications by Ryosuke WATANABE

The entities that hold a legal rights for patent applications filed by inventor WATANABE Ryosuke:

SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 7 Atsugi-shi, Kanagawa-ken, Japan
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 6 Kanagawa-ken, Japan
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 5 Atsugi-shi, Japan
Semiconductor Energy 1 Atsugi-shi, Japan
Semiconductor Energy Labortaory Co., Ltd. 1 Atsugi-shi, Kanagawa-ken, Japan

Recent patent applications by WATANABE Ryosuke

Ryosuke WATANABE from Isehara, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-05-16

US20190147312A1

Physics

Lamination system, IC sheet, scroll of IC sheet, and method for manufacturing IC chip

#2 | 2015-10-08

US20150287660A1

Electricity

LAMINATING SYSTEM, IC SHEET, SCROLL OF IC SHEET, AND METHOD FOR MANUFACTURING IC CHIP

#3 | 2014-08-07

US20140220745A1

Electricity

Laminating system

#4 | 2011-07-28

US20110183470A1

Electricity

Manufacturing method of semiconductor device

#5 | 2011-05-05

US20110104859A1

Electricity

Manufacturing method of semiconductor device

#6 | 2009-10-29

US20090269886A1

Electricity

Manufacturing method of semiconductor device

#7 | 2009-08-27

US20090212297A1

Electricity

Laminating system

#8 | 2009-05-07

US20090117681A1

Electricity

Semiconductor device and manufacturing method thereof

#9 | 2007-04-05

US20070077691A1

Electricity

Manufacturing method of semiconductor device

#10 | 2007-03-01

US20070045805A1

Physics

Method for manufacturing semiconductor device

#11 | 2006-01-19

US20060011288A1

Electricity

Laminating system, IC sheet, roll of IC sheet, and method for manufacturing IC chip

#12 | 2005-08-04

US20050167573A1

Electricity

Semiconductor device having photo sensor element and amplifier circuit

InventorID:

863387 ⎘