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Inventor profile of:

Markus Schwab

City:

Aalen

Country:

Germany

Published Applications:

24

Last publication date:

2025-11-06

Top Assignees for applications by Markus Schwab

The entities that hold a legal rights for patent applications filed by inventor Schwab Markus:

Carl Zeiss SMT GmbH 19 Oberkochen, Germany
Cad Zeiss AG 1 Oberkochen, Germany

Recent patent applications by Schwab Markus

Markus Schwab from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-11-06

US20250341782A1

CHROMATICALLY CORRECTED IMAGING ILLUMINATION OPTICAL UNIT FOR USE IN A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#2 | 2025-04-10

US20250116940A1

IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD

#3 | 2025-02-27

US20250068083A1

CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM AND PROJECTION ILLUMINATION METHOD

#4 | 2025-02-27

US20250068081A1

ILLUMINATION SYSTEM, PROJECTION ILLUMINATION FACILITY AND PROJECTION ILLUMINATION METHOD

#5 | 2024-07-11

US20240231107A1

DISPLAY DEVICE

#6 | 2019-04-25

US20190121107A1

Projection optical unit for EUV projection lithography

#7 | 2019-03-28

US20190094532A1

Methods and apparatuses for designing optical systems using machine learning with delano diagrams

#8 | 2019-01-24

US20190025562A1

Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit

#9 | 2018-03-29

US20180088303A1

Imaging optical unit and projection exposure apparatus including same

#10 | 2018-03-15

US20180074303A1

Imaging optical unit and projection exposure unit including same

#11 | 2017-11-23

US20170336714A1

Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator

#12 | 2017-02-09

US20170038691A1

Illumination system of a microlithographic projection exposure apparatus

#13 | 2016-03-24

US20160085061A1

Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit

#14 | 2016-03-10

US20160070176A1

Illumination system of a microlithographic projection exposure apparatus

#15 | 2015-11-05

US20150316854A1

Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations

#16 | 2015-08-20

US20150234291A1

Illumination system of a microlithographic projection exposure apparatus

#17 | 2015-07-16

US20150198437A1

Projection exposure apparatus for microlithography comprising an optical distance measurement system

#18 | 2015-06-04

US20150153654A1

Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element

#19 | 2015-01-29

US20150029477A1

Optical system for a microlithographic projection exposure apparatus

#20 | 2013-05-09

US20130114060A1

Illumination system of a microlithographic projection exposure apparatus

#21 | 2013-03-07

US20130057844A1

Illumination system of a microlithographic projection exposure apparatus

#22 | 2013-02-14

US20130038850A1

Illumination system and projection objective of a mask inspection apparatus

#23 | 2012-11-22

US20120293786A1

Illumination system of a microlithographic projection exposure apparatus

#24 | 2011-05-05

US20110102758A1

Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system

InventorID:

87039 ⎘