David Gerald Farber

City:

Plano, Texas

Country:

United States

Published Applications:

Last publication date:

2017-06-22

Top Assignees for applications by David Gerald Farber

The entities that hold a legal rights for patent applications filed by inventor Farber David Gerald:

David Gerald Farber from Plano, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Low damage low-k dielectric etch

Method of fabricating semiconductors

Method of fabricating semiconductors

Hard mask for source/drain epitaxy control

Method of forming a metal contact opening with a width that is smaller than the minimum feature size of a photolithographically-defined opening

Lateral uniformity in silicon recess etch

InventorID:

871768 ⎘