Aalen
Germany
13
2026-01-15
The entities that hold a legal rights for patent applications filed by inventor WEBER Joern:
Joern WEBER from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR PRODUCING A MEMS MIRROR ARRAY, AND MEMS MIRROR ARRAY
#2 | 2025-07-03MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TEMPERATURE OF A MIRROR
#3 | 2025-07-03MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A MIRROR
#4 | 2025-02-27MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM
#5 | 2023-08-17METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM
#6 | 2023-04-27OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
#7 | 2019-02-28OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME
#8 | 2019-01-31Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus
#9 | 2017-06-08Reflective optical element
#10 | 2016-09-15Reflective optical element, and optical system of a microlithographic projection exposure apparatus
#11 | 2013-02-14Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
#12 | 2012-01-26Reflective optical element for EUV lithography
#13 | 2012-01-19Reflective optical element for EUV lithography
87191 ⎘