Grenoble
France
35
2023-10-19
The entities that hold a legal rights for patent applications filed by inventor Blasco Nicolas:
Nicolas Blasco from Grenoble, FR has applied for patents for these inventions. The list has both pending applications and granted patents:
Silicon-based self-assembling monolayer compositions and surface preparation using the same
#2 | 2023-10-05THE FORMATION OF CATALYST PT NANODOTS BY PULSED/SEQUENTIAL CVD OR ATOMIC LAYER DEPOSITION
#3 | 2023-08-31SELECTIVE THERMAL ETCHING METHODS OF METAL OR METAL-CONTAINING MATERIALS FOR SEMICONDUCTOR MANUFACTURING
#4 | 2023-08-31DEVICES HAVING A RARE EARTH (OXY) FLUORIDE COATING FOR IMPROVED RESISTANCE TO CORROSIVE CHEMICAL ENVIRONMENTS AND METHODS FOR MAKING AND USING THESE DEVICES
#5 | 2023-06-15Low pressure process for synthesis of Pt(PF)involving a soluble intermediate and storage of obtained Pt(PF)
#6 | 2022-11-03SOLID MATERIAL CONTAINER AND SOLID MATERIAL PRODUCT WITH SOLID MATERIAL FILLED IN SOLID MATERIAL CONTAINER
#7 | 2021-09-09Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes
#8 | 2021-08-12Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
#9 | 2021-04-22Tungsten pentachloride conditioning and crystalline phase manipulation
#10 | 2021-04-08Preprocessing method for solid material, and solid material product filled with solid material manufactured using said solid material preprocessing method
#11 | 2020-12-31PREPARATION OF SI-H CONTAINING IODOSILANES VIA HALIDE EXCHANGE REACTION
#12 | 2020-09-24Tungsten pentachloride conditioning and crystalline phase manipulation
#13 | 2020-08-06LU-CONTAINING COMPOSITIONS AND METHODS OF PRODUCING THE SAME
#14 | 2020-07-02SOLID MATERIAL CONTAINER AND SOLID MATERIAL PRODUCT WITH SOLID MATERIAL FILLED IN SOLID MATERIAL CONTAINER
#15 | 2019-12-05Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films
#16 | 2019-11-07Preparation of Si-H containing iodosilanes via halide exchange reaction
#17 | 2019-10-31Tungsten pentachloride conditioning and crystalline phase manipulation
#18 | 2019-01-24Tungsten pentachloride conditioning and crystalline phase manipulation
#19 | 2018-11-15Etching reactants and plasma-free etching processes using the same
#20 | 2018-05-31Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
#21 | 2018-04-12Preparation of Si—H containing iodosilanes via halide exchange reaction
#22 | 2016-07-07Manganese-containing film forming compositions, their synthesis, and use in film deposition
#23 | 2016-05-12Method for forming cobalt containing films
#24 | 2016-04-28Cobalt-containing film forming compositions, their synthesis, and use in film deposition
#25 | 2016-04-21Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications
#26 | 2014-08-28Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
#27 | 2013-02-05Aluminum implant using new compounds
#28 | 2013-01-01High C content molecules for C implant
#29 | 2011-11-10Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process
#30 | 2011-10-06Method of forming a tantalum-containing layer on a substrate
#31 | 2011-08-25Method of depositing a metal-containing dielectric film
#32 | 2011-08-11Niobium and vanadium organometallic precursors for thin film deposition
#33 | 2010-03-04Use of group V metal containing precursors for a process of depositing a metal containing film
#34 | 2009-12-17Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing
#35 | 2009-08-13Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
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