Milton, Vermont
United States
11
2017-08-10
The entities that hold a legal rights for patent applications filed by inventor Milo Gary L.:
Gary L. Milo from Milton, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Test structure for monitoring interface delamination
#2 | 2016-11-24Semiconductor device with metal extrusion formation
#3 | 2016-11-24Semiconductor device with metal extrusion formation
#4 | 2015-12-31Semiconductor device with metal extrusion formation
#5 | 2015-12-17Silicon waveguide structure with arbitrary geometry on bulk silicon substrate, related systems and program products
#6 | 2015-09-10Controlled metal extrusion opening in semiconductor structure and method of forming
#7 | 2015-08-13Formation of an asymmetric trench in a semiconductor substrate and a bipolar semiconductor device having an asymmetric trench isolation region
#8 | 2015-07-16Methods of managing metal density in dicing channel and related integrated circuit structures
#9 | 2015-05-21Formation of an asymmetric trench in a semiconductor substrate and a bipolar semiconductor device having an asymmetric trench isolation region
#10 | 2014-12-04Metal wires of a stacked inductor
#11 | 2014-09-04Controlled metal extrusion opening in semiconductor structure and method of forming
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