Inventor profile of:

David C. Thomas

City:

Richmond, Vermont

Country:

United States

Published Applications:

16

Last publication date:

2016-11-24

Top Assignees for applications by David C. Thomas

The entities that hold a legal rights for patent applications filed by inventor Thomas David C.:

Recent patent applications by Thomas David C.

David C. Thomas from Richmond, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-11-24
US20160343798A1
Electricity

Semiconductor device with metal extrusion formation

#2 | 2016-11-24
US20160343797A1
Electricity

Semiconductor device with metal extrusion formation

#3 | 2015-12-31
US20150380478A1
Electricity

Semiconductor device with metal extrusion formation

#4 | 2015-12-03
US20150348876A1
Electricity

Tsv wafer with improved fracture strength

#5 | 2015-09-10
US20150255404A1
Electricity

Methods of forming a TSV wafer with improved fracture strength

#6 | 2015-09-10
US20150255395A1
Electricity

Controlled metal extrusion opening in semiconductor structure and method of forming

#7 | 2015-02-05
US20150035117A1
Electricity

Method for reducing lateral extrusion formed in semiconductor structures and semiconductor structures formed thereof

#8 | 2015-01-22
US20150021743A1
Electricity

Uniform roughness on backside of a wafer

#9 | 2014-10-02
US20140291802A1
Electricity

Semiconductor structures with metal lines

#10 | 2014-09-04
US20140246777A1
Electricity

Controlled metal extrusion opening in semiconductor structure and method of forming

#11 | 2012-01-19
US20120012976A1
Electricity

Fuse structure having crack stop void, method for forming and programming same, and design structure

#12 | 2011-09-15
US20110221064A1
Electricity

Electromigration resistant aluminum-based metal interconnect structure

#13 | 2010-09-23
US20100237503A1
Electricity

Electromigration resistant aluminum-based metal interconnect structure

#14 | 2009-09-17
US20090230555A1
Electricity

TUNGSTEN LINER FOR ALUMINUM-BASED ELECTROMIGRATION RESISTANT INTERCONNECT STRUCTURE

#15 | 2007-11-29
US20070275565A1
Electricity

FULL REMOVAL OF DUAL DAMASCENE METAL LEVEL

#16 | 2006-01-03
US10687294
-

Single and multilevel rework

InventorID:

894013 ⎘