Masamitsu Itoh

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2014-11-06

Top Assignees for applications by Masamitsu Itoh

The entities that hold a legal rights for patent applications filed by inventor Itoh Masamitsu:

Masamitsu Itoh from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Reticle chuck cleaner and reticle chuck cleaning method

Method for selecting photomask substrate, method for manufacturing photomask, and method for manufacturing semiconductor device

InventorID:

957734 ⎘