Inventor profile of:

Mitsuru HIROSHIMA

City:

Osaka

Country:

Japan

Published Applications:

24

Last publication date:

2018-01-11

Top Assignees for applications by Mitsuru HIROSHIMA

The entities that hold a legal rights for patent applications filed by inventor HIROSHIMA Mitsuru:

Recent patent applications by HIROSHIMA Mitsuru

Mitsuru HIROSHIMA from Osaka, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-01-11
US20180012802A1
Electricity

Element chip manufacturing method

#2 | 2017-11-30
US20170345781A1
Electricity

Element chip manufacturing method

#3 | 2017-11-30
US20170345715A1
Electricity

Element chip manufacturing method

#4 | 2017-09-14
US20170263526A1
Electricity

Element chip and method for manufacturing the same

#5 | 2017-09-14
US20170263525A1
Electricity

ELEMENT CHIP AND METHOD FOR MANUFACTURING THE SAME

#6 | 2017-09-14
US20170263524A1
Electricity

Element chip and method for manufacturing the same

#7 | 2017-09-14
US20170263501A1
Electricity

ELEMENT CHIP AND METHOD FOR MANUFACTURING THE SAME

#8 | 2017-09-14
US20170263500A1
Electricity

Method for manufacturing element chip

#9 | 2017-08-10
US20170229366A1
Electricity

Method of manufacturing element chip and element chip

#10 | 2017-08-10
US20170229365A1
Electricity

Method of manufacturing element chip and element chip

#11 | 2017-04-06
US20170098591A1
Electricity

Method of manufacturing element chip and element chip

#12 | 2017-03-09
US20170069536A1
Electricity

Plasma treatment method and method of manufacturing electronic component

#13 | 2017-03-09
US20170069522A1
Electricity

Method of forming mask pattern, method of processing substrate, and method of fabricating element chips

#14 | 2016-03-03
US20160064188A1
Electricity

Plasma processing apparatus and plasma processing method

#15 | 2015-11-26
US20150340208A1
Electricity

Plasma processing method and apparatus

#16 | 2015-11-26
US20150340203A1
Electricity

Plasma processing apparatus and method

#17 | 2014-11-13
US20140335696A1
Electricity

Plasma processing apparatus and plasma processing method

#18 | 2014-11-13
US20140332497A1
Electricity

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#19 | 2011-05-12
US20110111601A1
Electricity

Plasma processing apparatus and plasma processing method

#20 | 2010-07-08
US20100173431A1
Electricity

Wafer reclamation method and wafer reclamation apparatus

#21 | 2010-04-15
US20100089870A1
Electricity

Plasma processing apparatus and plasma processing method

#22 | 2009-09-03
US20090218045A1
Electricity

PLASMA PROCESSING APPARATUS

#23 | 2008-06-12
US20080138993A1
Electricity

Plasma Processing Apparatus

#24 | 2007-06-14
US20070131652A1
Electricity

Plasma etching method

InventorID:

964910 ⎘