Inventor profile of:

David P. Taylor

City:

Hawthorne, California

Country:

United States

Published Applications:

9

Last publication date:

2014-09-18

Top Assignees for applications by David P. Taylor

The entities that hold a legal rights for patent applications filed by inventor Taylor David P.:

Recent patent applications by Taylor David P.

David P. Taylor from Hawthorne, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2014-09-18
US20140264757A1
Electricity

Metal structures and methods of using same for transporting or gettering materials disposed within semiconductor substrates

#2 | 2014-05-22
US20140141604A1
Electricity

Systems and methods for preparing films using sequential ion implantation, and films formed using same

#3 | 2013-07-25
US20130187169A1
Electricity

Systems and methods for depositing materials on either side of a freestanding film using selective thermally-assisted chemical vapor deposition (STA-CVD), and structures formed using same

#4 | 2013-02-21
US20130043486A1
Electricity

System and methods for preparing freestanding films using laser-assisted chemical etch, and freestanding films formed using same

#5 | 2012-11-29
US20120301095A1
Electricity

Systems and methods for preparing films using sequential ion implantation, and films formed using same

#6 | 2012-10-04
US20120248460A1
Electricity

Systems and methods for depositing materials on either side of a freestanding film using laser-assisted chemical vapor deposition (LA-CVD), and structures formed using same

#7 | 2012-09-20
US20120235281A1
Electricity

Systems and methods for preparing films comprising metal using sequential ion implantation, and films formed using same

#8 | 2012-03-01
US20120049200A1
Electricity

Systems and methods for preparing freestanding films using laser-assisted chemical etch, and freestanding films formed using same

#9 | 2011-03-17
US20110064370A1
Electricity

Systems and methods for preparing films using sequential ion implantation, and films formed using same

InventorID:

97083 ⎘