Newburgh, New York
United States
12
2013-11-07
The entities that hold a legal rights for patent applications filed by inventor Wise Richard:
Richard Wise from Newburgh, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for simultaneously forming features of different depths in a semiconductor substrate
#2 | 2013-02-21TRENCH FORMATION IN SUBSTRATE
#3 | 2012-06-21Integrated circuit system with reduced polysilicon residue and method of manufacture thereof
#4 | 2012-06-07CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials
#5 | 2010-05-06CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials
#6 | 2010-04-06Method of forming gate stack and structure thereof
#7 | 2009-07-30Method for non-selective shallow trench isolation reactive ion etch for patterning hybrid-oriented devices compatible with high-performance highly-integrated logic devices
#8 | 2009-07-23Method and structure for forming trench DRAM with asymmetric strap
#9 | 2009-04-30Thermal gradient control of high aspect ratio etching and deposition processes
#10 | 2009-03-12Dielectric spacer removal
#11 | 2008-04-03ELEVATED TEMPERATURE CHEMICAL OXIDE REMOVAL MODULE AND PROCESS
#12 | 2007-12-06CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials
97259 ⎘