Satoshi Shibui

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2026-03-05

Top Assignees for applications by Satoshi Shibui

The entities that hold a legal rights for patent applications filed by inventor Shibui Satoshi:

Satoshi Shibui from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM

PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM

PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM

Photosensitive resin composition, photosensitive resin laminate, resin pattern production method, cured film, and display device

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE

Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device

Positive photosensitive resin composition

Positive photosensitive resin composition

InventorID:

983093 ⎘