Aalen
Germany
65
2026-05-07
The entities that hold a legal rights for patent applications filed by inventor Kugler Jens:
Jens Kugler from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL MODULE AND PROJECTION EXPOSURE SYSTEM
#2 | 2026-04-23PROJECTION OBJECTIVE OF A PROJECTION EXPOSURE SYSTEM, AND PROJECTION EXPOSURE SYSTEM
#3 | 2025-07-03OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM COMPRISING SAME AND PROJECTION EXPOSURE SYSTEM COMPRISING THE OPTICAL ELEMENT AND/OR THE OPTICAL SYSTEM
#4 | 2024-05-30OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS
#5 | 2023-12-21SYSTEM AND PROJECTION EXPOSURE APPARATUS
#6 | 2023-06-15OPTICAL ELEMENT, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING AN OPTICAL ELEMENT
#7 | 2023-04-06Damping arrangement for vibration damping of an element in an optical system
#8 | 2023-03-09METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MODULE AND ARRANGEMENT FOR SEMICONDUCTOR LITHOGRAPHY
#9 | 2022-09-08SUPPORT OF AN OPTICAL UNIT
#10 | 2021-06-17Supporting an optical element
#11 | 2021-03-18Projection exposure apparatus for semiconductor lithography
#12 | 2019-07-18Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus
#13 | 2019-03-28Optical imaging arrangement with a piezoelectric device
#14 | 2018-12-27OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING OPTICAL ELEMENTS WITH SUPPORTING DEVICE LOCATED IN NON-EQUIDISTANT MANNER
#15 | 2018-09-27Optical imaging arrangement with actively adjustable metrology support units
#16 | 2018-09-13Optical Projection System
#17 | 2018-06-28OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
#18 | 2018-01-25SUPPORT ELEMENTS FOR AN OPTICAL ELEMENT
#19 | 2017-12-07Positioning unit and apparatus for adjustment of an optical element
#20 | 2017-08-03Optical projection system
#21 | 2017-03-23Microlithographic projection exposure apparatus and measuring device for a projection lens
#22 | 2016-06-23Optical imaging arrangement with simplified manufacture
#23 | 2016-05-26OPTICAL IMAGING DEVICE
#24 | 2016-03-17EUV imaging apparatus
#25 | 2016-02-11REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT
#26 | 2016-02-11Positioning unit and apparatus for adjustment of an optical element
#27 | 2015-11-12Optical projection system
#28 | 2015-11-05Support elements for an optical element
#29 | 2015-06-18LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AND RELATED METHOD
#30 | 2015-06-18Optical element unit for exposure processes
#31 | 2015-04-23Optical imaging device with thermal attenuation
#32 | 2015-03-12Replacement apparatus for an optical element
#33 | 2014-12-18Positioning unit and apparatus for adjustment of an optical element
#34 | 2014-09-18Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant manner
#35 | 2014-09-11Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner
#36 | 2014-05-08Optical module with a measuring device
#37 | 2014-01-23LITHOGRAPHY APPARATUS AND METHOD
#38 | 2013-10-31Positioning unit and apparatus for adjustment of an optical element
#39 | 2013-10-24Replacement apparatus for an optical element
#40 | 2013-10-24Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#41 | 2013-07-25Imaging optical system for microlithography
#42 | 2013-07-11EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY
#43 | 2013-05-30Positioning unit and alignment device for an optical element
#44 | 2013-05-16Exposure apparatus and measuring device for a projection lens
#45 | 2013-05-09Optical imaging device with thermal attenuation
#46 | 2013-04-25Optical element module with minimized parasitic loads
#47 | 2013-02-21Optical projection system
#48 | 2012-11-29Optical arrangement in a microlithographic projection exposure apparatus
#49 | 2012-03-22Support elements for an optical element
#50 | 2012-02-02Optical imaging device and method for reducing dynamic fluctuations in pressure difference
#51 | 2012-01-26Positioning unit and alignment device for an optical element
#52 | 2011-10-20Replacement apparatus for an optical element
#53 | 2011-09-08Protection module for EUV lithography apparatus, and EUV lithography apparatus
#54 | 2010-10-28Replacement apparatus for an optical element
#55 | 2010-09-30Positioning unit and alignment device for an optical element
#56 | 2010-08-26Optical element module with minimized parasitic loads
#57 | 2010-08-12Projection objective for microlithography
#58 | 2010-06-10Exposure apparatus and measuring device for a projection lens
#59 | 2009-10-01Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#60 | 2009-09-03OPTICAL DEVICE WITH STIFF HOUSING
#61 | 2009-05-28Optical imaging device with thermal attenuation
#62 | 2008-08-14Optical element unit for exposure processes
#63 | 2008-08-07Optical imaging device and method for reducing dynamic fluctuations in pressure difference
#64 | 2008-01-17Optical imaging device
#65 | 2007-03-29MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
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