Daejeon
South Korea
39
2026-03-26
29
2026-02-10
These are the the leading inventors for applications assigned to DNF CO., LTD.:
DNF CO., LTD. based in Daejeon, KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
METHOD OF MANUFACTURING SACRIFICIAL LAYER AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
#2 | 2025-06-05COMPOSITION FOR DEPOSITING A MOLYBDENUM-CONTAINING THIN FILM, METHOD FOR MANUFACTURING A MOLYBDENUM-CONTAINING THIN FILM, AND MOLYBDENUM-CONTAINING THIN FILM MANUFACTURED THEREBY
#3 | 2025-05-22SILICON COMPOUNDS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
#4 | 2025-05-15THIN-FILM FORMING COMPOSITION INCLUDING ALUMINUM COMPOUND, METHOD OF FORMING THIN FILM BY USING THE THIN-FILM FORMING COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#5 | 2023-12-21PROCESS OF FORMING SILICON-CONTAINING FILM AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
#6 | 2023-12-21SILICON COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
#7 | 2023-09-28SILICON PRECURSOR HAVING A HETEROCYCLIC GROUP, COMPOSITION FOR DEPOSITING A SILICON-CONTAINING LAYER COMPRISING THE SAME AND METHOD OF DEPOSITING A SILICON-CONTAINING LAYER USING THE SAME
#8 | 2023-09-28 ✅ Patent 12,546,001 granted on 2026-02-10COMPOSITION FOR DEPOSITING A SILICON-CONTAINING LAYER AND METHOD OF DEPOSITING A SILICON-CONTAINING LAYER USING THE SAME
#9 | 2023-08-10 ✅ Patent 12,384,805 granted on 2025-08-12IODINE-CONTAINING METAL COMPOUND AND COMPOSITION FOR DEPOSITING THIN FILM INCLUDING THE SAME
#10 | 2023-07-06 ✅ Patent 12,459,959 granted on 2025-11-04INDIUM COMPOUND, METHOD OF PRODUCING THE SAME, COMPOSITION FOR DEPOSITING INDIUM-CONTAINING THIN FILM, AND INDIUM-CONTAINING THIN FILM
#11 | 2023-06-29 ✅ Patent 12,473,647 granted on 2025-11-18COMPOSITION FOR DEPOSITING ANTIMONY-CONTAINING THIN FILM AND METHOD FOR MANUFACTURING ANTIMONY-CONTAINING THIN FILM USING THE SAME
#12 | 2023-03-23 ✅ Patent 12,518,963 granted on 2026-01-06COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME
#13 | 2022-12-01SILICON COMPOUNDS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
#14 | 2022-09-01 ✅ Patent 12,304,924 granted on 2025-05-20Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same
#15 | 2022-06-09 ✅ Patent 12,398,459 granted on 2025-08-26SILICON METAL OXIDE ENCAPSULATION FILM COMPRISING METAL OR METAL OXIDE IN THIN FILM, AND MANUFACTURING METHOD THEREFOR
#16 | 2022-05-05 ✅ Patent 11,749,522 granted on 2023-09-05Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same
#17 | 2022-01-20 ✅ Patent 11,459,653 granted on 2022-10-04Method for manufacturing molybdenum-containing thin film and molybdenum-containing thin film manufactured thereby
#18 | 2021-07-22 ✅ Patent 11,447,859 granted on 2022-09-20Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same
#19 | 2021-05-20 ✅ Patent 11,319,333 granted on 2022-05-03Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same
#20 | 2020-12-17 ✅ Patent 11,358,974 granted on 2022-06-14Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
#21 | 2020-11-19 ✅ Patent 11,390,635 granted on 2022-07-19Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same
#22 | 2020-10-29 ✅ Patent 11,827,650 granted on 2023-11-28Method of manufacturing ruthenium-containing thin film and ruthenium-containing thin film manufactured therefrom
#23 | 2020-07-23TIN COMPOUND, TIN PRECURSOR COMPOUND FOR FORMING A TIN-CONTAINING LAYER, AND METHODS OF FORMING A THIN LAYER USING THE SAME
#24 | 2020-04-30 ✅ Patent 10,894,799 granted on 2021-01-19Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same
#25 | 2020-04-09 ✅ Patent 11,393,676 granted on 2022-07-19Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same
#26 | 2019-10-03 ✅ Patent 11,062,940 granted on 2021-07-13Organometallic precursors, methods of forming a layer using the same and methods of manufacturing semiconductor devices using the same
#27 | 2019-05-16 ✅ Patent 10,882,873 granted on 2021-01-05Method of forming tin-containing material film and method of synthesizing a tin compound
#28 | 2019-05-09 ✅ Patent 10,913,755 granted on 2021-02-09Transition metal compound, preparation method therefor, and composition for depositing transition metal-containing thin film, containing same
#29 | 2019-04-25 ✅ Patent 11,230,492 granted on 2022-01-25Anti-glare glass and manufacturing method therefor
#30 | 2018-06-07TIN COMPOUND, METHOD OF SYNTHESIZING THE SAME, TIN PRECURSOR COMPOUND FOR ATOMIC LAYER DEPOSITION, AND METHOD OF FORMING TIN-CONTAINING MATERIAL FILM
#31 | 2018-04-12 ✅ Patent 10,361,118 granted on 2019-07-23Organometallic precursors, methods of forming a layer using the same and methods of manufacturing semiconductor devices using the same
#32 | 2018-03-15 ✅ Patent 10,224,200 granted on 2019-03-05Aluminum compound, method of forming thin film by using the same, and method of fabricating integrated circuit device
#33 | 2017-07-20 ✅ Patent 10,134,583 granted on 2018-11-20Methods of forming a low-k dielectric layer and methods of fabricating a semiconductor device using the same
#34 | 2017-05-04 ✅ Patent 9,916,974 granted on 2018-03-13Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition
#35 | 2016-11-17 ✅ Patent 10,202,407 granted on 2019-02-12Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same
#36 | 2016-11-10 ✅ Patent 9,809,608 granted on 2017-11-07Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same
#37 | 2016-07-14 ✅ Patent 10,214,610 granted on 2019-02-26Polymer and composition containing same
#38 | 2016-05-05 ✅ Patent 9,586,979 granted on 2017-03-07Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
#39 | 2014-12-11 ✅ Patent 9,245,740 granted on 2016-01-26Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
Also check out DNF CO., LTD.'s (Daejeon, South Korea) applicant profile with 29 patent applications submitted.
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