Leica Microsystems Lithography Ltd.

City:

Cambridge

Country:

United Kingdom

Published Applications:

Last publication date:

2006-03-02

Patent Grants:

Last grant date:

2006-03-28

Top Inventors for applications by Leica Microsystems Lithography Ltd.

These are the the leading inventors for applications assigned to Leica Microsystems Lithography Ltd.:

Timothy Groves 2 Cambridge, United Kingdom
Nigel Crosland 2 Cambridgeshire, United Kingdom
Paul George Harris 1 Haverhill, United Kingdom
Klaus-Dieter Adam 1 Jena, Germany

Nigel CROSLAND 1 Linton, United Kingdom
Brian Raferty 1 Suffolk, United Kingdom
Amin Javer 1 Cambridge, United Kingdom
Brian Rafferty 1 Bury St. Edmunds, United Kingdom

Andrew Dean 1 Stansted, United Kingdom
Gerhard Schubert 1 Jena, Germany
Paul Harris 1 Haverhill, United Kingdom
John Tingay 1 Cambridge, United Kingdom

Jeffrey Kristoff 1 Hilton Head Island, SC United States

Recent patent applications by Leica Microsystems Lithography Ltd.

Leica Microsystems Lithography Ltd. based in Cambridge, GB has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2006-03-02 ✅ Patent 7,019,308 granted on 2006-03-28

US20060043311A1

Electricity

Thermal compensation in magnetic field influencing of an electron beam

#2 | 2006-02-14 ✅ Patent 6,998,621 granted on 2006-02-14

US10760843

Cooling of a device for influencing an electron beam

#3 | 2005-04-26 ✅ Patent 6,885,009 granted on 2005-04-26

US10405500

Device for influencing an electron beam

#4 | 2005-04-07

US20050073203A1

Performing operations; transporting

Stage for a workpiece

#5 | 2005-03-03 ✅ Patent 7,053,388 granted on 2006-05-30

US20050045836A1

Electricity

Dual-mode electron beam lithography machine

#6 | 2005-02-17

US20050035308A1

Electricity

Pattern writing equipment

AssigneeID:

289861 ⎘