TOKYO
Japan
3
2012-10-02
2
2012-10-02
These are the the leading inventors for applications assigned to TOKYO EECTRON LIMITED:
TOKYO EECTRON LIMITED based in TOKYO, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
CVD apparatus and method of cleaning the CVD apparatus
#2 | 2006-11-23 ✅ Patent 7,704,893 granted on 2010-04-27Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD
#3 | 2006-10-19Method of scavenging intermediate formed by reaction of oxidoreductase with substrate
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