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Inventor profile of:

Hitoshi Murata

City:

Tokyo

Country:

Japan

Published Applications:

4

Last publication date:

2012-10-02

Top Assignees for applications by Hitoshi Murata

The entities that hold a legal rights for patent applications filed by inventor Murata Hitoshi:

RENESAS ELECTRONICS CORPORATION 2 Kawasaki-shi, Japan
CANON ANELVA CORPORATION 2 Kawasaki-shi, Japan
ULVAC, INC. 2 Chigasaki-shi, Japan
National Institute of Advanced Industrial Science and Technology 2 Tokyo, Japan
Sony Corporation 2 Tokyo, Japan
HITACHI KOKUSAI ELECTRIC INC. 2 Tokyo, Japan
RESEARCH INST. OF INNOVATIVE TECH. FOR THE EARTH 2 Souraku-gun, Japan
Sanyo Electric Co., Ltd. 2 Moriguchi-shi, Japan
TOKYO EECTRON LIMITED 1 TOKYO, Japan
TOKYO ELECTRON LIMITED 1 Tokyo, Japan
FUJITSU SEMICONDUCTOR LIMITED 1 Yokohama-shi, Japan
SHOWA DENKO K.K. 1 Tokyo, Japan
PANASONIC CORPORATION 1 Kadoma-shi, Japan
MITSUBISHI DENKI KABUSHIKI KAISHA 1 Tokyo, Japan
KANTO DENKA KOGYO CO., LTD. 1 Tokyo, Japan
National Inst of Adv. Industrial Sci. and Tech 1 Tokyo, Japan

Recent patent applications by Murata Hitoshi

Hitoshi Murata from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2012-10-02

US10492539

CVD apparatus and method of cleaning the CVD apparatus

#2 | 2006-09-21

US20060207630A1

Chemistry; metallurgy

Device for cleaning CVD device and method of cleaning CVD device

#3 | 2006-09-14

US20060201533A1

Cvd apparatus and method for cleaning cvd apparatus

#4 | 2005-11-17

US20050252451A1

Performing operations; transporting

Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas

InventorID:

4697539 ⎘