Hitachi
Japan
7
2022-05-12
7
2022-07-19
These are the the leading inventors for applications assigned to SCIOCS COMPANY LIMITED:
SCIOCS COMPANY LIMITED based in Hitachi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Structure manufacturing method and intermediate structure
#2 | 2022-01-27 ✅ Patent 11,342,220 granted on 2022-05-24Structure manufacturing method and manufacturing device, and light irradiation device
#3 | 2021-11-11 ✅ Patent 11,289,322 granted on 2022-03-29Structure manufacturing method including surface photoelectrochemical etching and structure manufacturing device
#4 | 2021-10-07 ✅ Patent 11,342,191 granted on 2022-05-24Structure manufacturing method, structure manufacturing apparatus and intermediate structure
#5 | 2020-07-02 ✅ Patent 11,339,500 granted on 2022-05-24Nitride crystal substrate, semiconductor laminate, method of manufacturing semiconductor laminate and method of manufacturing semiconductor device
#6 | 2018-06-07 ✅ Patent 11,075,077 granted on 2021-07-27Nitride semiconductor template and nitride semiconductor device
#7 | 2010-10-14 ✅ Patent 9,194,055 granted on 2015-11-24Nitride semiconductor substrate
Also check out SCIOCS COMPANY LIMITED's (Hitachi, Japan) applicant profile with 6 patent applications submitted.
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