Leica Microsystems Lithography GmbH

City:

Country:

Germany

Published Applications:

Last publication date:

2005-12-29

Patent Grants:

Last grant date:

2007-07-10

Top Inventors for applications by Leica Microsystems Lithography GmbH

These are the the leading inventors for applications assigned to Leica Microsystems Lithography GmbH:

Dirk Beyer 1 Weimar, Germany
Peter Hudek 1 Jena, Germany

Recent patent applications by Leica Microsystems Lithography GmbH

Leica Microsystems Lithography GmbH based in , DE has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2005-12-29 ✅ Patent 7,241,542 granted on 2007-07-10

US20050287450A1

Performing operations; transporting

Process for controlling the proximity effect correction

AssigneeID:

397422 ⎘